ISSN : 0970 - 020X, ONLINE ISSN : 2231-5039
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Photodecomposition of Oxalic Acid using Sensitizers Undet N2-Laser Irradiation

N. Sahoo* and R. J. Galagali

Laser Laboratories Department of Chemistry, Banaras Hindu University Varangsi-221 005 India.

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ABSTRACT:

The study of photodecomposition of oxalic acid in presence of sensitizers (e. g., uranyl nitrate, sodium tungstate, potassium molbdate and potassium chromate) under nitrogen laser irradiation shows that the rate of decomposition is increasing with time of irradiation at room temperature (294°K). This decomposition follows the formation of intermediates which further undergo fragmentation to give CO. COa and HCOOH. The percentage of decomposition of oxalic acid is maximum at 60 minutes of exposure at various concentrations of sensitizers. The percentage of decomposition increases in the order oxalic acid/UO2++ < potassium oxalate/UO2++< oxalic acid/WO4— < oxalic acid/MoO4~ < oxalic acid/CrO4-- due to the nature of the sensitizers used.

KEYWORDS:

Photodecomposition; Sensitizers

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Sahoo N, Galagali R. J. Photodecomposition of Oxalic Acid using Sensitizers Undet N2-Laser Irradiation. Orient J Chem 1990;6(2).


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Sahoo N, Galagali R. J. Photodecomposition of Oxalic Acid using Sensitizers Undet N2-Laser Irradiation. Orient J Chem 1990;6(2). Available from: http://www.orientjchem.org/?p=40120



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