Sensitized Photo-Oxidation of Dimethylglyoxime by Fenton Reagent
Nidhi Bhatt, Punita Sharma, Rekha Chandak and B.V. Kabra
Department of Chemistry, M.L.V. Government College, Bhilwara - 311001, (India)
Photo-sensitized oxidation of dimethylglyoxime by fenton reagent was studied at pH 1.9. The effect of concentration of substrate (dimethylglyoxime), photocatalyst (fenton reagent) and acid on the rate of photochemical reaction was also observed. The reaction was also carried out in different solvents in order to study the effect of polarity of solvent on the reaction. Butanedione and nitrite ion have been characterized as photoproducts. A tentative mechanism for the photochemical reaction has been given.
KEYWORDS:Photo-oxidation; Dimethylglyoxime ; Fenton reagent
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| Copy the following to cite this article: Bhatt N, Sharma P, Chandak R, Kabra B. V. Sensitized Photo-Oxidation of Dimethylglyoxime by Fenton Reagent. Orient J Chem 2004;20(3). |
| Copy the following to cite this URL: Bhatt N, Sharma P, Chandak R, Kabra B. V. Sensitized Photo-Oxidation of Dimethylglyoxime by Fenton Reagent. Orient J Chem 2004;20(3). Available from: http://www.orientjchem.org/?p=18896 |
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