Abstract

Nathu Lal^1,2, Kanhaiya Chawla^1,3, Sandeep Sharma^1,4, Deepak Kumar Yadav¹, Chhagan Lal ^1,5*

DOI : http://dx.doi.org/10.13005/ojc/390116

Electro-deposition approach was used to produce zinc oxide nanostructure thin films for switching applications in optoelectronic devices. The aqueous solution of zinc nitrate (0.1, 0.5 & 1.0 M) and potassium nitrate (1.0M) of pH 6 were prepared at 65°C with constant stirring and nanostructure of ZnO thin film was deposited onto indium doped tin oxide (ITO) coated glass substrates. The morphology and growth size of deposited nanostructure thin film was analysed by SEM. The structural information was examined using XRD spectrum, which suggested that the deposited nanostructure thin films were crystalline with wurtzite phase. FTIR results gave information about metal oxide (ZnO) bonds and optical properties that was supported by the synthesized nanostructure. The effect of potential and concentration of used salts on the growth of ZnO nanostructure was also studied. Therefore, current-voltage characteristics were measured and applied for the switching properties in optoelectronic devices.

Electro-deposition; Nanostructure; Optoelectronic devices; Thin Film

[ View HTML Full Text]