Abstract

R.K. Pathak and Sipi Mohan

DOI : http://dx.doi.org/10.13005/ojc/290327

The In containing AlSe thin films were electrosynthesized by electrochemical co-deposition technique. The morphological properties of thin films were studied through the Scanning Electron Micrograph (SEM) while the structural features through X-Ray Diffraction technique (XRD). The deposition current along with the film thickness values, the charge carrier density, flat band potential, corrosion characteristics i.e., corrosion current, corrosion potential and corrosion rate were calculated.

Potentiostatic Electrodeposition;Saturated Calomel Electrode (SCE);Scanning Electron Micrograph (SEM);X-Ray Diffraction (XRD);Charge Carrier Density (ND);Flat Band Potential (Efb);Corrosion Current (Icorr);Corrosion Potential (Vcorr) and Corrosion Rate (CR)

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