ISSN : 0970 - 020X, ONLINE ISSN : 2231-5039
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Abstract

Atomic Force Microscopy Studies on The Surface Morphologies of Chemical Bath Deposited Cus Thin Films

Ho Soonmin

DOI : http://dx.doi.org/10.13005/ojc/320325


Abstract:

In this work, copper sulphide thin films were deposited onto microscope glass slide by chemical bath deposition technique. The tartaric acid was served as complexing agent to chelate with Cu2+ to obtain complex solution. The influence of pH value on the surface morphologies of the films has been particularly investigated using the atomic force microscopy technique. The atomic force microscopy results indicate that the CuS films deposited at pH 1 were uniform, compact and pinhole free. However, the incomplete surface coverage observed for the films prepared at high pH (pH 2 and 2.5) values.

Keywords:

Chemical bath deposition; atomic force microscopy; thin films; film thickness; surface roughness; copper sulphide.

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