Abstract

M. Kanakaraj and H. B. Ramalingam

DOI : http://dx.doi.org/10.13005/ojc/330624

Nickel iron films are vitally used in new generation recording heads, designing of micro electro mechanical devices and magnetic random access memory. The addition of tungsten (W) can enhance magnetic and mechanical properties of NiFe thin films.  Electrodeposited Ni-Fe-W films were prepared at different temperature (30, 50, 70 and 90˚C) and they were subjected to morphological, structural, magnetic and mechanical characterization analysis. Nickel content was maximum as 61.41 wt% at 90˚C temperature. The tungsten content increased when electrolytic bath temperature was increased. Ni-Fe-W films were bright and uniformly coated on the surface. Also the deposits of Ni- Fe- W films were in nano scale and the average crystalline size was around 22 nm. Thin films prepared at high temperature exhibited a high saturation magnetization and low coercivity.The micro hardness of Ni-Fe-W was 221 VHN at 90˚C

Electrodeposition; Electrolytic Bath; Crystalline Size; VSM; Ni-Fe; X-ray Diffraction; VHN; SEM

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